Atomic Layer Deposition (ALD) system used for thin-film growth.
We design and control thin-film materials using Atomic Layer Deposition (ALD) and related techniques. Our work focuses on interfaces and defects in oxides and 2D materials for electronic and energy applications, including high-k dielectrics and transition metal dichalcogenides. We combine synthesis and characterization to understand and control materials at the nanoscale.
We are always interested in motivated undergraduate and graduate students. Contact us to learn more.
Research Focus
- Thin-film growth and interfaces
- Optical and electronic properties
- 2D materials